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SHV-H
Key Features
- Ion source capable of high-speed static removal in a high-vacuum environment
- Real-time On/Off control is possible without operation delay
- No separate process gas is required, so there is no effect on chamber pressure
- No UV rays and harmful wavelengths
- No need for a separate cooling unit
- Providing a customized Flange to the installation chamber
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You will receive catalogues, manuals and leaflets.
Technical Support & Customer Support
Specifications
| Parameter | Description / Value |
|---|---|
| Ion Generation Method | -8-5Electro-Magnetic Field |
| Operation Circumstance | 10⁻⁵ ~ 10⁻⁸ torr |
| Material | SUS 304, Polycarbonate |
| Weight | 2.86kg |
| Warranty | 1 year |
Decay Time Characteristics
- Electrostatic performance over distance
- Vacuum Level : 3 X 10⁻⁷ torr
- Charged Voltage : ±1000V → ±100V (150mm x 150mm Plate)
- Window to Charge Plate : 200mm ~ 2000mm
- Measurements taken in our test chamber and may vary depending on the installation environment and conditions.
Dimensions
