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SHV-H

SHV-H

Key Features

  • Ion source capable of high-speed static removal in a high-vacuum environment
  • Real-time On/Off control is possible without operation delay
  • No separate process gas is required, so there is no effect on chamber pressure
  • No UV rays and harmful wavelengths
  • No need for a separate cooling unit
  • Providing a customized Flange to the installation chamber

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You will receive catalogues, manuals and leaflets.

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Technical Support & Customer Support

Specifications

ParameterDescription / Value
Ion Generation Method-8-5Electro-Magnetic Field
Operation Circumstance10⁻⁵ ~ 10⁻⁸ torr
MaterialSUS 304, Polycarbonate
Weight2.86kg
Warranty1 year

Decay Time Characteristics

  • Electrostatic performance over distance
  • Vacuum Level : 3 X 10⁻⁷ torr
  • Charged Voltage : ±1000V → ±100V (150mm x 150mm Plate)
  • Window to Charge Plate : 200mm ~ 2000mm
  • Measurements taken in our test chamber and may vary depending on the installation environment and conditions.

Dimensions